Large enhancement of ferroelectric polarization in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> films by low plasma energy pulsed laser deposition

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چکیده

PLD of ferroelectric HfO 2 done under a mixed Ar and O atmosphere allows the reduction plasma energy, resulting in fewer defects an increase polarization around 50% compared to films grown by conventional PLD.

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ژورنال

عنوان ژورنال: Journal of Materials Chemistry C

سال: 2022

ISSN: ['2050-7526', '2050-7534']

DOI: https://doi.org/10.1039/d1tc05387f